Autors: Kotlarski G., Valkov S., Andreeva A., Mateev, V. M., Marinova, I. Y., Petrov P.
Title: Electrical contact resistance of tungsten coatings deposited on Cu and Al conductors
Keywords: Cu conductor; Electrical contact resistance; Electron beam e

References

    Issue

    21st International Conference and School on Quantum Electronics: Laser Physics and Applications, ICSQE, Journal of Physics: Conference Series, 2021, 2021, Bulgaria, DOI 10.1088/1742-6596/1859/1/012063

    Цитирания (Citation/s):
    1. Vassallo, E., Pedroni, M., Aloisio, M., Minelli, D., Nardone, A., Chen, H., ... & Di Fonzo, F. (2023). Study of process parameters and characteristics properties of W coatings deposited by rf plasma sputtering. Journal of Vacuum Science & Technology B, 41(3). - 2023 - в издания, индексирани в Scopus или Web of Science
    2. Sun, D., Tian, S., Yin, C., Chen, F., Xie, J., Huang, C., & Li, C. (2023). Thin Film Deposition Techniques in Surface Engineering Strategies for Advanced Lithium-Ion Batteries. Coatings, 13(3), 505. - 2023 - в издания, индексирани в Scopus или Web of Science
    3. Doddapaneni VVK, Lee K, Aysal HE, Paul BK, Pasebani S, Sierros KA, Okwudire CE, Chang C-h. A Review on Progress, Challenges, and Prospects of Material Jetting of Copper and Tungsten. Nanomaterials. 2023; 13(16):2303. https://doi.org/10.3390/nano13162303 - 2023 - в издания, индексирани в Scopus или Web of Science

    Вид: публикация в международен форум, публикация в реферирано издание, индексирана в Scopus