Autors: Minkov, D. A.
Title: The influence of Ar pressure on the structure and optical properties of nonhydrogenated
Keywords: Amorphous silicon, Thin-film deposition techniques

Abstract: Seven 1.1–1.4-μm-thick hydrogen-free amorphous‑silicon (a-Si) thin films were deposited at high rates (larger than 10 Å/s), by rf magnetron sputtering (RFMS) onto room-temperature glass substrates. The influence of argon-gas pressure on the structural and optical properties of these amorphous films has been systematically studied. We have used the Wemple-DiDomenico (WD) single-effective-oscillator model, n2(ℏω)−1=EdE0/ (E0 2−(ℏω)2), in order to determine the WD parameters oscillator strength or dispersion energy, Ed, and oscillator energy, E0. The amorphous-to-crystalline mass-density ratio, ρa/ρx, in the empirical expression for Ed, proposed by Wemple, is the key factor in understanding the refractive-index behaviour of the RFMS-a-Si thin films. The value of the static refractive index, n(0), which is related to both the atomic structure and mass density, remains approximately constant up to a threshold Ar-gas pressure of nearly 1 Pa, and then it starts dropping rather abruptly.

References

    Issue

    , 2019, United Kingdom, Elsevier, ISSN 00223093

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    Вид: публикация в международен форум, публикация в издание с импакт фактор, публикация в реферирано издание, индексирана в Scopus