Autors: Angelov, G. V., Nikolov, D. N., Spasova, M. L., Rusev, R. P.
Title: Study of Process Variability-Sensitive Local Device Parameters for 14-nm Bulk FinFETs
Keywords: threshold voltage variability

Abstract: In this paper we study the threshold voltage variability using the Pelgrom plot. The measurement data consists of drain current, output characteristics and threshold voltage for 14-nm FinFETs depending on their location on the silicon wafer. The results showed that the technology is mature with small mismatch and parameter variability.



    43rd International Spring Seminar on Electronics Technology, 2020, Slovakia, DOI: 10.1109/ISSE49702.2020.9121152

    Вид: публикация в международен форум, публикация в реферирано издание, индексирана в Scopus