Детайли за публикацията
(Publication details)

Оригинал (Original)
Автори: П. Динев., Николова, Д. Н.
Заглавие: Технологична характеристика на магнитно стимулиран бариерен разряд
Ключови думи: Surface engineering, magnetostimulated dielectric barrier discharge, technological characteristics, magnetron dielectric barrier discharge, plasma surface modification

Абстракт: An important factor in the utility of magnetron plasma sources for sputtering at low pressures and other vacuum applications is their drift-induced uniformity over large distances. The usual configuration in planar magnetron sputtering plasma sources is a long, oval racetrack in which the plasma undergoes E/B drift around the racetrack. This drift ensures uniformity of the negative glowplasma in the direction perpendicular to the electric and magnetic fields. In the high-pressure (atmospheric) dielectric barrier and hybrid corona-dielectric barrier non-equilibrium plasma sources this technology is not usable yet. Two new innovative methods of magnetic stimulation are demonstrated. The first of them is characterized by crossed or co-linear electric and magnetic fields, and the second – by a parallel-plate or co-planar dielectric barrier plasma source with at least one silicone electrical steel powered electrode. Surface density of real power increasing and discharge state changing with

Библиография

    Издание
    International Scientific Journal Machines. Technologies. Materials MTM 2010, брой 4, стр. стр. 39-44, 2010, България, София, Научно-технически съюз по машиностроене, ISSN 1313-0226

    Пълен текст на публикацията

    Autors: P. Dineff., Gospodinova, D. N.
    Title: Technological characteristic of magnetostimulated dielectric barrier discharge
    Keywords: Surface engineering, magnetostimulated dielectric barrier discharge, technological characteristics, magnetron dielectric barrier discharge, plasma surface modification

    Abstract: An important factor in the utility of magnetron plasma sources for sputtering at low pressures and other vacuum applications is their drift-induced uniformity over large distances. The usual configuration in planar magnetron sputtering plasma sources is a long, oval racetrack in which the plasma undergoes E/B drift around the racetrack. This drift ensures uniformity of the negative glowplasma in the direction perpendicular to the electric and magnetic fields. In the high-pressure (atmospheric) dielectric barrier and hybrid corona-dielectric barrier non-equilibrium plasma sources this technology is not usable yet. Two new innovative methods of magnetic stimulation are demonstrated. The first of them is characterized by crossed or co-linear electric and magnetic fields, and the second – by a parallel-plate or co-planar dielectric barrier plasma source with at least one silicone electrical steel powered electrode. Surface density of real power increasing and discharge state changing with

    References

      Issue
      International Scientific Journal Machines. Technologies. Materials MTM 2010, issue 4, pp. 39-44, 2010, Bulgaria, Sofia, Scientific-technical union of mechanical engineering, ISSN 1313-0226

      Full text of the publication

      Вид: публикация в международен форум, публикация в реферирано издание

      Въведена от: доц. д-р Диляна Николаева Николова