Оригинал (Original)
Автори: Mitov M., Видеков, В. Х., Цанева, Б. Р., Bankova A., Popov Tsv.
Заглавие: Oxidation of aluminum in a DC argon/oxygen plasma
Ключови думи: Plasma oxidation; Plasma chemical reactor; DC gas discharge;

Абстракт: The aim of this work was to investigate oxidation of aluminum in Ar/O2 mixture DC gas discharge. The experiments were performed in a prototype cylindrical plasma chemical reactor with sectional cathode and common anode. The method of horizontal sections was customized and used as main diagnostic to determine the kinetics of the oxide growth. The Langmuir probe was used as substrate. The oxide grown in the plasma on the aluminum substrate has been studied by atomic force microscopy (AFM). Analyzing the experimental data, we find that the kinematics of oxide growth can be controlled over time at the same discharge current and gas pressure. The obtained aluminum oxide films are thin and robust, making them suitable for micro and nanoelectronic applications.

Библиография

    Издание

    Международной научно-практической конференции «КОЗЫБАЕВСКИЕ ЧТЕНИЯ - 2017: Казахстан и современные вызовы времени», том 2, стр. стр. 78-84, 2017, Казахстан, Петропавловск, СКГУ им.М.Козыбаева, ISBN 978-601-223-066-6

    Пълен текст на публикацията

    		Autors: Mitov M., Videkov, V. H., Tzaneva, B. R., Bankova A., Popov Tsv.
    Title: Oxidation of aluminum in a DC argon/oxygen plasma
    Keywords: Plasma oxidation; Plasma chemical reactor; DC gas discharge; Langmuir probe

    Abstract: The aim of this work was to investigate oxidation of aluminum in Ar/O2 mixture DC gas discharge. The experiments were performed in a prototype cylindrical plasma chemical reactor with sectional cathode and common anode. The method of horizontal sections was customized and used as main diagnostic to determine the kinetics of the oxide growth. The Langmuir probe was used as substrate. The oxide grown in the plasma on the aluminum substrate has been studied by atomic force microscopy (AFM). Analyzing the experimental data, we find that the kinematics of oxide growth can be controlled over time at the same discharge current and gas pressure. The obtained aluminum oxide films are thin and robust, making them suitable for micro and nanoelectronic applications.

    References

      Issue

      International Scientific and Practical Conference "KOZYBAEV READINGS - 2017: Kazakhstan and modern challenges of the time", vol. 2, pp. 78-84, 2017, Kazakhstan, Petropavl, NKSU M.Kozybayev, ISBN 978-601-223-066-6

      Full text of the publication

      Вид: публикация в международен форум