Детайли за публикацията
(Publication details)

Autors: Blagoev B., Vlakhov E., Videkov, V. H., Tzaneva, B. R., Łuka G., Witkowski B., Terziyska P., Leclercq J., Krajewski T., Guziewicz E., Dimitrov D., Mehandzhiev V., Sveshtarov P.
Title: Atomic layer deposition of ZnO:Al on PAA substrates
Keywords: porous anodic alumina, atomic layer deposition, zinc oxide, ellipsometry

Abstract: In this work the ZnO:Al films of different thickness are grown on the Porous Anodic Alumina (PAA) and p-Si (100) substrates by Atomic Layer Deposition. The ZnO:Al films thicknesses are chosen appropriately in order to obtain complete filled pores as well as pores with a thin covering on the surface. The obtained structures are investigated with spectroscopic ellipsometry and Scanning Electron Microscopy (SEM) techniques.

References

    Issue
    Journal of Physics: Conference Series, vol. 764, pp. 012004, 2016, United Kingdom, IOP Publishing, ISBN 1742-6596 (online), 1742-6588 (print)

    Вид: статия в списание, публикация в реферирано издание, индексирана в Scopus и Web of Science

    Въведена от: доц. д-р Боряна Рангелова Цанева