|Autors: Bankova A., Andreev, S. K., Raykov K., Mitov M., Videkov, V. H., Tzaneva, B. R., Dimitrova E.|
Title: Growth of Thin Films of Nanostructured Oxide on Dielectric Base
Keywords: anodic aluminum oxide (AAO); anodization; microprocessor system; nanoporous; thin film
Abstract: The anodic aluminum oxide (AAO) is known for a wide range of applications in classical electronics, nanotechnology, UHF modules and others. In some of these applications, oxide layers with a small thickness (in the range of micron or parts of a micron) are used. The report examines the peculiarities of the preparation of such layers associated with the small thickness of the oxide layer and the initial layer. In anodizing of the initial layer should be resolved the issues related to the current density in the thin conductive layer, with an uneven distribution of the potential, release of heat and others. A technological solution to obtain such thin layers using specially designed system for smooth local anodizing operated by a microprocessor is presented. During the process, the change of the total current is constantly monitored and the area to be anodized is being controlled.
Вид: статия в списание
Въведена от: доц. д-р Боряна Рангелова Цанева