Детайли за публикацията
(Publication details)

Autors: Tzaneva, B. R., Andreev, S. K., Zahariev, A. S., Ruskova, K. G.
Title: Effect of Electroless Nickel Deposition on the Breakdown Voltage of Nanoporous
Keywords: anodic aluminium oxide, breakdown voltage, electroless nickel deposition, reanodization

Abstract: Anodic aluminium oxide films were formed in various acidic solutions and further covered by Ni and Cu coatings. Certain of them were reanodized to thicken their barrier sub-layer. As a final outcome, printed circuit board-like multi-layer structure Al/Al2O3/Ni/Cu is produced. In this case, it is clearly demonstrated that the breakdown voltage of anodic oxide depends on its overall thickness, barrier sub-layer thickness, metal coating availability as well as to some extent on pore diameter.

References

    Issue
    XXVII International Scientific Conference Electronics - ET2018, pp. DOI: 10.1109/ET.2018.8549625, 2018, Bulgaria, IEEE, ISBN 978-1-5386-6692-0

    Copyright IEEE

    Вид: постер/презентация в международен форум, публикация в реферирано издание, индексирана в Scopus

    Въведена от: доц. д-р Боряна Рангелова Цанева