|Autors: Tzaneva, B. R., Andreev, S. K., Zahariev, A. S., Ruskova, K. G.|
Title: Effect of Electroless Nickel Deposition on the Breakdown Voltage of Nanoporous
Keywords: anodic aluminium oxide, breakdown voltage, electroless nickel deposition, reanodization
Abstract: Anodic aluminium oxide films were formed in various acidic solutions and further covered by Ni and Cu coatings. Certain of them were reanodized to thicken their barrier sub-layer. As a final outcome, printed circuit board-like multi-layer structure Al/Al2O3/Ni/Cu is produced. In this case, it is clearly demonstrated that the breakdown voltage of anodic oxide depends on its overall thickness, barrier sub-layer thickness, metal coating availability as well as to some extent on pore diameter.
Вид: постер/презентация в международен форум, публикация в реферирано издание, индексирана в Scopus
Въведена от: доц. д-р Боряна Рангелова Цанева