Autors: Delibozov, N. G., Radonov, R. I., Hristov, M. H.
Title: Design and Fabrication of ”Matrix” MEMS Device
Keywords: MEMS, microelectronics technology, sidewall embedded

Abstract: This paper presents the design and development of library elements used for design and fabrication of MEMS devices and MEMS based, piezoresistive sensor for microforce measurement. The output of the physical design is foundry ready and can be sent to any foundry in CIF or GDS ІІ format. Boron diffusion process combined with deep reactive ion etching (DRIE) technique is used to form the side direction force sensors. The monolithic MEMS prototypes have been micro machined.

References

  1. Mohamed Gad-el-Hak MEMS Applications, CRC Pres Taylor & Francis Group, 2006, ISBN: 0-8493-9139-3.
  2. SoftMEMS LLC, 2006, Manual, Los Gatos, CA, SoftMEMS LLC.
  3. T. Chu Duc, J. F. Creemer, Piezoresistive Cantilever Beam for Force Sensing in Two Dimensions , IEEE Sensors Journal, Vol. 7, No. 1, January 2007.
  4. Havemann et al. 1990. Integrate Circuit Trench Resistor. U.S. Patent 4,962,365, filed March 30, 1989, and issued October 9, 1990.
  5. V. Stavrov, E. Tomerov, G. Stavreva, J. Kirov, New technology for fabricating of lateral actuated MEMS devices, Proceedings of the National Conference Electronica 2010, Sofia, 2010, pp. 245–250.

Issue

Annual Journal of Electronics, vol. 8, pp. 32-35, 2014, Bulgaria, ISSN 1314-0078

Вид: статия в списание, публикация в реферирано издание