Autors: Boyadzhiev, S. I., Rasovska, M. M., Matsumura, Y., Kotani, Y., Yordanov, R. S., Yordanova, I. R.
Title: Characterization of reactive sputtered ITO and TiO2/ITO thin films for applications at elevated temperatures
Keywords: Characterisation, Different substrates, Elevated temperature, EPMAFTIR spectrophotometers, Gas sensors, Heat reflective coatings, High resolutionIndium tin oxide, ITO thin filmsLaser ellipsometry, Magnetron reactive sputtering, Optimal properties, Post deposition annealing, Profile analysis, Radio frequencies, Reactive gas, SEM, Structure change, Target composition, Technological parameters, Thermal IRTiO, Underlayers, XPSXRD

Abstract: In this work are discussed the technology for preparing and characterisation of indium-tin oxide (ITO) and ITO with titanium oxide underlayer thin films with properties appropriate for usage at elevated temperatures as heat reflective coatings and gas sensors. For preparing the samples the methods of radio frequency (RF) and DC-magnetron reactive sputtering were used. Sputtering of indium-tin and ITO targets with different composition in presence of oxygen as reactive gas was made. The technological parameters were studied to obtain films with optimal properties at different substrates - glass, silicon, quartz. Heating of the substrates during the preparation and their postdeposition annealing in different environments also were studied. Comparison how the different techniques and target composition affect on the films' properties was made. The composition and microstructure of the films were studied by XPS, EPMA and XRD, the surface of the films was observed by a high-resolution SEM.

References

    Issue

    ISSE 2010 - 33rd International Spring Seminar on Electronics Technology: Polymer Electronics and Nanotechnologies: Towards System Integration - Conference Proceedings, pp. 65-70, 2010, Poland, ISBN ISBN: 978-142447850-7

    Цитирания (Citation/s):
    1. Bragaglia, M., Lamastra, F.R., Tului, M., (...), Valentini, M., Nanni, F., Low temperature sputtered ITO on glass and epoxy resin substrates: influence of process parameters and substrate roughness on morphological and electrical properties,Surfaces and Interfaces 17,100365 - 2019 - в издания, индексирани в Scopus или Web of Science

    Вид: публикация в международен форум, публикация в реферирано издание, индексирана в Scopus и Web of Science