| Autors: Stoeva D., Kotlarski G., Dechev D., Ivanov N., Ormanova M., Mateev, V. M., Marinova, I. I. Title: Formation and electrical conductance of TiO2 coatings on Cu substrates Keywords: Abstract: In this work, the possibility of formation of TiO2 coatings on Cu substrates was investigated using a pure Ti interlayer. The structure of the formed specimens was studied using X-ray diffraction (XRD), and their electrical conductance was determined using electrical impedance spectroscopy (EIS) measurements. During the experiments, the deposition time for the TiO2 films was varied. The results indicate that the Ti interlayer did not affect the output conductance results for the TiO2 samples. The last exhibited very low conductance similar to that of semi-conductive materials. In the case of the deposition of the TiO2 coating for the shorter time the XRD method was insufficient to determine the presence of TiO2 atop the its’ surface due to the low thickness of this layer. However, the presence of metal-oxide layers on the surface of that sample was successfully established by means of impedance measurements and electrical conductance calculations. References
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Вид: публикация в международен форум, публикация в издание с импакт фактор, публикация в реферирано издание, индексирана в Scopus и Web of Science